R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV

The R&D of basic technologies such as mask, resist, optical element, optics. have been carried out at NewSUBARU synchrotron light facility since 1996. EUV Lithography started use in production from 2019 for 7 nm node logic devices and from 2020 for 5 nm node logic devices. Current status and prospect of EUV and usage probability of BEUV will be reported.

And the necessity of BEUV-FEL will be discussed.