Thermal Analysis of 3D Stacking and BEOL Technologies with Functional Partitioning of Many-Core RISC-V SoC
Mohamed Naeim, Herman Oprins, Sudipta Sekhar Das, Geert Van der Plas, Yun Dai, Pinhong Chen, C. T. Kao, Dwaipayan Biswas, Dragomir Milojevic
2024 · 인용 11
Thermal challenges in 3D-IC arise from the high thermal resistance of the 3D interface layer and Back-End-Of-Line (BEOL), leading to poor heat dissipation & increased peak junction temperature. In this study we analyze the impact of technology and material parameters of Embedded micro-Bumps(E-μBumps)and Wafer-to- Wafer (W2W)-Hybrid Bonding (HB) on thermal behaviour of the package stack. Thermal analysis is conducted on a 64-core SoC with power density of140\ W/cm2using advanced A14 nanosheet CMOS technology.
Simulation outcomes demonstrate that as the amount of metal in the 3D interface increases (relative to dielectric) from 0% to 20%, the peak temperatureTmaxofE-μBumpsdecreases by 20%, beyond whichTmaxis limited by the BEOL thermal resistance. The study demonstrates that at 20% metal density, the thermal impact of stand-off height is negligible, regardless of 3D interface technology. Among 2-die stacks, Memory-on-Logic (MoL) configuration exhibits the highestTmax, 5{}°Cabove the 2D baseline, while 3-tier stack increaseTmaxby12{}°C, necessitating an extra 33% heat transfer efficiency to reduceTmax.
Additionally, for BEOL analysis, introducing backside PDN, results in2{}°Cincrease for 2D and2{}°Creduction for 3D (MoL) configurations.